MPCVD single crystal diamond deposition equipment

Suitable applications:

Preparation of High Quality Single Crystal Diamond by Chemical Vapor Deposition

Preparation of high-quality polycrystalline diamond self-supporting thick films by chemical vapor deposition

Preparation of High Quality Polycrystalline Diamond Thin Films by Chemical Vapor Deposition

Preparation of various carbon nanofilms such as graphene, carbon nanotubes, fullerenes and diamond films by chemical vapor deposition

Features:

This product is a stainless steel cavity type 6kw microwave plasma equipment with high power density;

Water-cooled substrate stage and water-cooled metal reflection chamber ensure that the system can work stably for a long time;

The substrate temperature is achieved by microwave plasma self-heating;

The vacuum measuring instrument adopts a full-scale vacuum gauge, which can accurately measure the background vacuum and working gas pressure;

The vacuum pump and valve use turbo molecular pump (the ultimate vacuum is 1×10-5Pa) and rotary vane mechanical vacuum pump (the ultimate vacuum is 1Pa), and the system can automatically control the deposition pressure;

Equipped with cooling water circulation system to ensure long-term safe and stable operation of the device under high power;

The system has a 15-inch touch screen, PLC automatic control, constant temperature or air pressure can be set, and up to 20 sets of process files can be saved and reused;

Fully automatic process control module for stable and reliable preparation of high-quality diamond films and crystals

Specifications and Characteristics